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Cosmetics Ingredients
The material selection platform
Cosmetics Ingredients
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Products Compatible with Synthetic Japan Wax #112

Based on HSP Distance

Products Compatibility & HSP Distance

Hansen Solubility Parameters (HSP) helps to predict the compatibility of ingredients.

It is based upon the “like seeks like” principle. It splits an ingredients interactions into three parameters :
- δD (Dispersion force interactions)
- δP (Polar forces interactions)
- δH (Hydrogen bond force interactions).

If ingredients have matching HSP’s (distance=0) then they will be completely compatible. If there is a small distance between them then they are predicted to have good but not perfect compatibility. As the HSP distance gets larger the ingredients will become more incompatible.

In general, ingredients having an HSP distance below 2 will have good compatibility. Between 2 and 4, you will have medium compatibility. Above 4, you will have limited to no compatibility.

Most HSP values used to calculate the distance are estimates. Information provided below is to be used as an indication of compatibility.

RSAW®

Cosmetics ingredients supplied by Hunan Resun Auway Industrial

18 products match your search
Product Name
Supplier
Description
Hunan Resun Auway Industrial
RSAW® AOS 35/ZA by Hunan Resun Auway Industrial is olefin sulfate grade. It is used as a surfactant. It can enhance the cleaning efficiency of formula and produce rich foam. RSAW® AOS 35/ZA is... view more
Hunan Resun Auway Industrial
RSAW® ETC40/ZT by Hunan Resun Auway Industrial is used as a surfactant. It is suitable for high quality and low viscosity formulations. RSAW® ETC40/ZT is recommended for use in hair shampoos and... view more
Hunan Resun Auway Industrial
RSAW® TL40/T/ZA by Hunan Resun Auway Industrial is used as a surfactant. It is recommended for use in hair shampoos and shower products. RSAW® TL40/T/ZA is suitable for high quality and low... view more
Hunan Resun Auway Industrial
HSP Distance: 0
Cocamide DEA. RSAW® 6501 by Hunan Resun Auway Industrial is used as a foaming and foam stabilizing agent. It can enhance the cleaning efficiency and viscosity of liquid products. It can protect skin... view more
INCI
  • COCAMIDE DEA
Hunan Resun Auway Industrial
HSP Distance: 0
Cocamide MEA. RSAW® CMEA/G by Hunan Resun Auway Industrial is used as a foaming and foam stabilizing agent. It can protect skin and hair from oil & grease removal. It can enhance the cleaning... view more
INCI
  • COCAMIDE MEA
Hunan Resun Auway Industrial
HSP Distance: 0
Cocamide MEA. RSAW® CMEA/N is used as a foaming and foam stabilizing agent. This grade by Hunan Resun Auway Industrial can protect skin and hair from oil & grease removal. It can enhance the... view more
INCI
  • COCAMIDE MEA
Hunan Resun Auway Industrial
HSP Distance: 0
Cocamidopropylamine Oxide. RSAW® POB/ZA by Hunan Resun Auway Industrial is a mild, soft foaming and foam stabilizing agent. It exhibits good cleaning abilities. RSAW® POB/ZA is suitable for use in... view more
INCI
  • COCAMIDOPROPYLAMINE OXIDE
Hunan Resun Auway Industrial
HSP Distance: 2.8
Ammonium Lauryl Sulfate. RSAW® AL 25/TZA by Hunan Resun Auway Industrial is used as a surfactant. RSAW® AL 25/TZA is used in shampoos, foam bath preparations, toiletries and cleaning product... view more
INCI
  • AMMONIUM LAURYL SULFATE
Hunan Resun Auway Industrial
HSP Distance: 2.8
Ammonium Lauryl Sulfate. RSAW® AL 30/T/ZA by Hunan Resun Auway Industrial is used as a surfactant. RSAW® AL 30/T/ZA is recommended for use in shampoos, foam bath preparations, toiletries and... view more
INCI
  • AMMONIUM LAURYL SULFATE
Hunan Resun Auway Industrial
HSP Distance: 2.8
Ammonium Lauryl Sulfate. RSAW® AL 70/ZA by Hunan Resun Auway Industrial is active ammonium dodecyl sulfate. It is used as a surfactant. RSAW® AL 70/ZA is suitable for use in shampoos, foam bath... view more
INCI
  • AMMONIUM LAURYL SULFATE
Hunan Resun Auway Industrial
HSP Distance: 2.9
Sodium Laureth Sulfate. RSAW® ESA 70/ZA by Hunan Resun Auway Industrial is 70% concentrated sodium lauryl ether (1EO) sulfate. It is used as a surfactant. RSAW® ESA 70/ZA is used in the formulation... view more
INCI
  • SODIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 2.9
Sodium Laureth Sulfate. RSAW® ESB 3/ZA by Hunan Resun Auway Industrial is 27% concentrated sodium lauryl ether (2EO) sulfate. It is used as a surfactant. RSAW® ESB 3/ZA is recommended for use in the... view more
INCI
  • SODIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 2.9
Sodium Laureth Sulfate. RSAW® ESB 70/ZA by Hunan Resun Auway Industrial is 70% concentrated sodium lauryl ether (2EO) sulfate. It is used as a surfactant. This grade is especially useful in high... view more
INCI
  • SODIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 2.9
Sodium Laureth Sulfate. RSAW® ESC3/ZA by Hunan Resun Auway Industrial is 28% concentrated sodium lauryl ether (3EO) sulfate. It is used as a surfactant. RSAW® ESC3/ZA is suitable for use in the... view more
INCI
  • SODIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 3.1
Ammonium Laureth Sulfate. RSAW® EAA 70/ZA by Hunan Resun Auway Industrial is used as a surfactant. This is active ammonium lauryl ether (1EO) sulfate. It is especially used in low pH value... view more
INCI
  • AMMONIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 3.1
Ammonium Laureth Sulfate. RSAW® EAB 25/ZA by Hunan Resun Auway Industrial is used as a surfactant. It is active ammonium lauryl ether (2EO) sulfate without impurities. RSAW® EAB 25/ZA is used in... view more
INCI
  • AMMONIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 3.1
Ammonium Laureth Sulfate. RSAW® EAC 25/ZA is used as a surfactant by Hunan Resun Auway Industrial. It is active ammonium lauryl ether (3EO) sulfate without impurities. RSAW® EAC 25/ZA is recommended... view more
INCI
  • AMMONIUM LAURETH SULFATE
Hunan Resun Auway Industrial
HSP Distance: 3.1
Ammonium Laureth Sulfate. RSAW® EAC 70/ZA by Hunan Resun Auway Industrial is used as a surfactant. This is active ammonium lauryl ether (3EO) sulfate. RSAW® EAC 70/ZA is suitable for use in... view more
INCI
  • AMMONIUM LAURETH SULFATE
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