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The material selection platform
Cosmetics Ingredients
The material selection platform
Cosmetics Ingredients
by SpecialChem
 
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HETAINE CMP

Technical Datasheet | Supplied by Ethox Chemicals
Salt and alcohol free this material is ideal for ethnic products, mild shampoos and conditioning shampoos. This material is stable at extremes of pH even in 10% NaOH.
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Claims
Surfactants / Cleansing Agents > Amphoterics
CAS Number
93820-52-1
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