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The material selection platform
Cosmetics Ingredients
The material selection platform
Cosmetics Ingredients
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LMW Hyaluronic acid

Technical Datasheet | Supplied by Contipro Biotech
Linear polysaccharide. Used in skin care, after shave and after sun preparations. Possesses very good moisturising activity.
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Claims
Moisturizing Agents
Use Level
0,01 - 0,05 %Day and moisturising creams, 0,02 - 0,04 %Protective creams, 0,01 - 0,03 %Moisturising and body lotions, 0,005 - 0,02 %cleaning lotions, 0,02 - 0,06 %Moisturising gels, 0,005 - 0,02 %Skin tonics, 0,01 - 0,02 %After shave, 0,01 - 0,03 %After sun preparations, 0,02 - 0,05 %Cosmeceuticals for damaged skin
Product Status
COMMERCIAL
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