The Universal Selection Source: Cosmetics Ingredients

Patent

ARTIFICIAL SKIN


Application Date:
Mar 16, 2017
USPTO Patent:
US 15363011
Abstract:

The present invention relates to a method for producing artificial skin, comprising: adding a matrix metalloproteinase inhibitor and a heparanase inhibitor to an artificial skin formation culture medium comprising h...

Inventors:
Shunsuke Iriyama, Yokohama-shi (JP)
Kenichi Umishio, Yokohama-shi (JP)
Makoto Tsunenaga, Yokohama-shi (JP)
Shinji Inomata, Yokohama-shi (JP)
Eijiro Adachi, Yokohama-shi (JP)
International Classification:
A61K 31/4406 (20170316); A61K 38/07 (20170316); A61Q 19/08 (20170316); A61K 8/49 (20170316); A61K 8/64 (20170316); A61K 31/4184 (20170316); A61K 38/00 (20170316)

Claims

What is claimed is:

1. A method for promoting the regeneration and repair of the epidermal basement membrane and/or dermis of a subject in need of the regeneration and repair of the epidermal basement membrane and/or dermis, comprising applying a matrix metalloproteinase inhibitor and a heparanase inhibitor to a skin of the subject.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Divisional of U.S. application Ser. No. 14/496,534, filed Sep. 25, 2014, which is a Divisional of U.S. application Ser. No. 13/582,199, which issued as U.S. Pat. No. 8,871,505, on Oct. 28, 2014, and which is the U.S. National Stage application of PCT/JP2011/050887, filed Jan. 19, 2011,...

> Search in our Patent Database of 9,865 Patents

Online Course

Julian Hewitt
98 Days left to register

Thursday Jul 6 2017

By Julian Hewitt

Meet faster your high SPF & UVA targets. Julian Hewitt will share his unique expertise to help you select the right active(s), maximize their efficacy and ensure the photostability of the formulation.

232 Read More
Back to Top